MPC超微颗粒除尘机是用于 CMOS 图像传感器的全自动定向干式除尘系统。配备高分辨率相机可以识别超微颗粒异物,并引导粘尘机构高精度定向除尘,可去除基板/Sensor上大于700nm的异物。配备高速伺服模组,根据产能可选单/双工位,最高产能大于5000pcs/h。可输出报表,生成MAP图,同时数据可以上传客户MES系统。
灰尘检查及清除,DB检测
Partical Detection & Cleaning
半导体(光学模组, Wafer)
Semiconductor(Optical Module, Wafer)
封测行业(Sensor、R片、IC封测、指纹模组)
Semiconductor Packaging and Testing(Sensor, IR Filter, IC Testing, Fingerprint Module)
基准环境:(36pcs/料盘,10%灰尘率)
Baseline:(36pcs/tray,10% Partical Rate)
单工位:> 2500pcs/h;双工位:> 5000pcs/h
Single Station:> 2500pcs/h; Double Station:> 5000pcs/h
自动检查、准确识别
Automatic Inspection, Accurate ldentification
干法清洁,无残留、无污染
Dry Cleaning, Residue-Free, No Contamination
检测精度:>0.6um
Detection Accuracy:>0.6um
可动灰尘除去率:>99.9%
Floating Partical Removal Rate:>99.9%
尺寸/Size:W1200mm×D1100mm×H1850mm
重量/Weight:1000KG
1、MPC超微颗粒除尘机是用于 CMOS 图像传感器的全自动定向干式除尘系统。
The MPC Partical Removal Machine is a fully automatic directional dry partical removal system designed forCMOS image sensors.
2、MPC超微颗粒除尘机配备高分辨率相机可以识别超微颗粒异物,并引导粘尘机构高精度定向除尘,可去除基板/Sensor上大于700nm的异物。
With a high-resolution camera capable of identifvina ultra-fine particle contaminants. the svstem auides thepartical removal mechanism with high precision to target and remove contaminants larger than 700nm on thesubstrate/sensor.
3、MPC超微颗粒除尘机配备高速伺服模组,根据产能可选单/双工位,最高产能大于5000pcs/h。
With high-speed servo modules, the system offers the option of single or dual stations based on productioncapacity, with a maximum throughput exceeding 5000pcs/h.
4、MPC超微颗粒除尘机可输出报表,生成MAP图,同时数据可以上传客户MES系统。
The system can generate reports, create MAP diagrams, and upload data to the customer's MES systemsimultaneously.